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Palabras contadas: interferometry: 3
Villar, P.I. - Lombardo, F.C.
J. Phys. Conf. Ser. 2007;67(1)
2007

Descripción: Matter-wave interferometry has been largely studied in the last few years. Usually, the main problem in the analysis of the diffraction experiments is to establish the causes for the loss of coherence observed in the interference pattern. In this work, we use different type of environmental couplings to model a two slit diffraction experiment with massive particles. For each model, we study the effects of decoherence on the interference pattern and define a visibility function that measures the loss of contrast of the interference fringes on a distant screen. Finally, we apply our results to the experimental reported data on massive particles C70. © 2007 IOP Publishing Ltd.
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Tipo de documento: info:ar-repo/semantics/artículo

Moreno, C.H. - Marconi, M.C. - Kanizay, K. - Rocca, J.J. - Uspenskii, Yu.A. - Vinogradov, A.V. - Pershin, Yu.A.
Phys Rev E. 1999;60(1):911-917
1999

Temas:   article

Descripción: We have used a tabletop soft-x-ray laser and a wave-front division interferometer to probe the plasma of a pinch discharge. A very compact capillary discharge-pumped Ne-like Ar laser emitting at 46.9 nm was combined with a wave division interferometer based on Lloyd's mirror and Sc-Si multilayer-coated optics to map the electron density in the cathode region of the discharge. This demonstration of the use of tabletop soft-x-ray laser in plasma interferometry could lead to the widespread use of these lasers in the diagnostics of dense plasmas. ©1999 The American Physical Society.
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Tipo de documento: info:ar-repo/semantics/artículo

Wachulak, P.W. - Capeluto, M.G. - Menoni, C.S. - Rocca, J.J. - Marconi, M.C.
Opto-electron. Rev. 2008;16(4):444-450
2008

Descripción: The recent development of table top extreme ultraviolet (EUV) lasers have enabled new applications that so far were restricted to the use of large facilities. These compact sources bring now to the laboratory environment the capabilities that will allow a broader application of techniques related to nanotechnology and nanofabrication. In this paper we review the advances in the utilization of EUV lasers in nanopatterning. In particular we show results of the nanopatterning using a table-top capillary discharge laser producing 0.12-mJ laser pulses with 1.2-ns time duration at a wavelength λ = 46.9 nm. The nanopatterning was realized by interferometric lithography using a Lloyd's mirror interferometer. Two standard photoresists were used in this work, polymethyl methacrylate (PMMA) and hydrogen silsesquioxane (HSQ). Pillars with a full width half maximum (FWHM) diameter of 60 nm and holes with FWHM diameter of 130 nm were obtained over areas in excess of 500×500 μm2. © 2008 Versita Warsaw and Springer-Verlag Berlin Heidelberg.
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Tipo de documento: info:ar-repo/semantics/artículo